7:00-7:15 PST
7:20-8:00 PST
With Intel recently releasing news of a $20 billion investment into its Ocotillo campus in Chandler, Arizona, creating new fabrication facilities and new jobs in the area, Dominic is well placed to discuss his insights into the development and challenges of the semiconductor supply chain on construction.
8:05-8:40 PST
8:40-8:50 PST
Transition
8:50-9:00 PST
9:00-11:00 PST
9:00-9:25 PST
The UPW filter cascade: Functions, Risks and Recommendations
9:30 – 9:55 PST
Functional water solutions to enable advanced wet cleaning process for next-generation semiconductor device manufacturing
9:55 – 10:05 PST
Break
10:05 – 10:30 PST
Nanoparticles Characterization for Semiconductor UPW Production System Monitoring Using ICP-MS
10:35 – 11:00 PST
Nanoparticle Adsorption of Polish IEX resins investigated by MRI
9:00-11:00 PST
9:00-9:25 PST
Electrodialysis Reversal Enhanced by Ceramic Membranes for Recycling of Copper Wastewater
9:30 – 9:55 PST
Diversion of Hydrofluoric Acid and Ethylene Glycol Mix to Fluoride Wastewater for Treatment
Daniel Wilson, Samsung Austin Semiconductor
9:55 – 10:05 PST
Break
10:05 – 10:30 PST
Solutions to the Isopropanol Abatement Challenge
10:35 – 11:00 PST
HF Neutralization plants – lots of solids – huge potential for optimization
9:00-11:00 PST
9:00-9:25 PST
Evaluating Three Generations of UPW Filtration Technology Using SEMI C79
9:30 – 9:55 PST
Analysis of Trace Level Organic Compounds in Water and Sulfuric Acid Using Solid Phase Extraction Gas Chromatography – Mass Spectrometry
9:55 – 10:05 PST
Break
10:05 – 10:30 PST
300mm unpatterned wafer defect review and characterization with universal surface enhanced Raman spectroscopy
10:35 – 11:00 PST
A Practical Method Detection Limit (MDL) Determination Methodology Using Quality Data
9:00-11:00 PST
9:00-9:25 PST
Quantum Cascade Laser Cavity Ring-Down Spectroscopy Analyzers for PPT-level CO and CO2 Detection
9:30 – 9:55 PST
Detecting Aerosol Events Caused by Nanoparticles
9:55 – 10:05 PST
Break
10:05 – 10:30 PST
Enhanced rate-of-rise measurements using oxygen
10:35 – 11:00 PST
Measurement of nanoparticles and their precursors
11:00-12:00 PST