Ultrapure Micro 2021 Agenda – Day 1

Enabling Technology

Wednesday November 3rd

7:00-7:15 PST

Welcome Address and Best Presentation Awards 2021

7:20-8:00 PST

Keynote Address

Dominic Greensmith, Director of Construction, Intel

With Intel recently releasing news of a $20 billion investment into its Ocotillo campus in Chandler, Arizona, creating new fabrication facilities and new jobs in the area, Dominic is well placed to discuss his insights into the development and challenges of the semiconductor supply chain on construction.

8:05-8:40 PST

Annual IRDS Update

Slava Libman, FTD Solutions

8:40-8:50 PST

Transition

8:50-9:00 PST

Introduction to Technical Sessions

Technical sessions are broken up into 15 minute presentations. Each technical presentation is followed by 10 minutes live Q&A with the speaker - unless no Q&A is indicated.

9:00-11:00 PST

Ultrapure Water

9:00-9:25 PST

The UPW filter cascade: Functions, Risks and Recommendations

Jochen Ruth, Pall

9:30 – 9:55 PST

Functional water solutions to enable advanced wet cleaning process for next-generation semiconductor device manufacturing

Hideaki Iino, Kurita

9:55 – 10:05 PST

Break

10:05 – 10:30 PST

Nanoparticles Characterization for Semiconductor UPW Production System Monitoring Using ICP-MS

JinJin Wang, Air Liquide Electronics – Balazs Nanoanalysis

10:35 – 11:00 PST

Nanoparticle Adsorption of Polish IEX resins investigated by MRI

Pia Herrling, Ovivo

9:00-11:00 PST

Water & Wastewater Management

9:00-9:25 PST

 Electrodialysis Reversal Enhanced by Ceramic Membranes for Recycling of Copper Wastewater

Greg Newbloom, Membrion

9:30 – 9:55 PST

Hydrogen Peroxide Removal: GAC or Enzyme Approach?

Emma Feldman, Samsung Austin Semiconductor

9:55 – 10:05 PST

Break

10:05 – 10:30 PST

Solutions to the Isopropanol Abatement Challenge

Joerg Winter, DAS Environmental Expert

10:35 – 11:00 PST

HF Neutralization plants – lots of solids – huge potential for optimization

Jochen Ruth, Pall & Gerd Heser, Pall

9:00-11:00 PST

Ultra High Purity Chemicals

9:00-9:25 PST

Evaluating Three Generations of UPW Filtration Technology Using SEMI C79

Ryan Pavlick, Intel

9:30 – 9:55 PST

Analysis of Trace Level Organic Compounds in Water and Sulfuric Acid Using Solid Phase Extraction Gas Chromatography – Mass Spectrometry

Ha Nguyen, ChemTrace

9:55 – 10:05 PST

Break

10:05 – 10:30 PST

sub-10nm particle detection on 300mm wafers by Unisers

Ali Altun, Unisers

10:35 – 11:00 PST

A Practical Method Detection Limit (MDL) Determination Methodology Using Quality Data

Thomas Bzik, EMD Electronics

9:00-11:00 PST

Airborne Molecular Contamination (AMC) and High Purity Gases Control

9:00-9:25 PST

Quantum Cascade Laser Cavity Ring-Down Spectroscopy Analyzers for PPT-level CO and CO2 Detection

Florian Adler, Tiger Optics

9:30 – 9:55 PST

Detecting Aerosol Events Caused by Nanoparticles

Richard Remiarz, TSI Incorporated

9:55 – 10:05 PST

Break

10:05 – 10:30 PST

Enhanced rate-of-rise measurements using oxygen

Ian Rousseau, Hexisense

10:35 – 11:00 PST

Measurement of nanoparticles and their precursors

Joonas Vanhanen, Airmodus

11:00-12:00 PST

Networking and Discussion with Speakers and Delegates