UPM 2022 Recap

380
Delegates
76
Speakers
69
Discussions
15%
End-Users (Fabs)

Delegate Feedback

I really enjoyed all the conversations around PFAS Treatment Strategies and Detection. As an environmental engineer working on the consulting side of the business, it's refreshing to observe how aware the semiconductor industry is to the latest EPA regulations.
Environmental Engineer
Corollo Engineers
I've attended five straight years now. I continue to be impressed with the quality of the presentations, and their relevance to our current situations year by year. The opportunity to make contacts, elsewhere in the industry, is one of the significant benefits of this kind of format.
Business Development Director
Aqua Metrology Systems Ltd
Excellent mix of end users, suppliers, and technical experts. Overall takeaway was that UPM is a group worth belonging to and with a common goal to improve the industry.
Sales and Marketing
Evoqua
UPM 2022 was a good opportunity for me to take a step back from day to day needs to strategically evaluate our approach and see other approaches and tools.
Ultrapure Water Commissioning lead
LotusWorks
I thought UPM 2022 was a great experience overall. The setup was efficient and lead to informative sessions and good interactions with colleagues in the industry.
Project Development lead
Aquatech International
I see a need to get together as a whole and share experiences and new technologies. I think that the UPM conference has always been the avenue to grow technologies and new business.
Owner
Semiconductor Smart Solutions

Meet the Comoderators

  1. 1
  2. 2
  3. 3
  4. 4
  5. 5
  6. 6
  7. 7
  8. 8
  9. 9
  10. 10
  11. 11
  12. 12
  13. 13
  14. 14
  15. 15
  16. 16

Session Strands

Yield and Reliability

With 3D heterogeneous geometries, declining technology nodes, and new complex fab tools, how can facilities proactively address increasingly stringent quality parameters for chemicals, gases, and water? Find a selection of presentations from this strand below.

Critical Organics Risk Assessment of High-Purity Polymer Piping

Gary Van Schooenveld, CT Associates

Organic contamination present in Ultrapure Water and other liquids poses a risk of depositing on the wafer surface during processing and cleaning. Of greatest concern are those deposits that are non-volatile. These are designated as “Critical Organics”. The objectives of this study are to quantify the extraction of critical organics from high-purity piping in hot UPW; specifically, PFA and PVDF, assess the affinity of the organic contaminants to the wafer surface during spin processing, and to determine the relative concentrations of organic contamination remaining on the wafer surface as a function of temperature.

What is Known About Urea Control in UPW Systems?

Noga Fridman-Bishop, FTD Solutions

Urea is a chemical widely used as nitrogen fertilizer and as a feed supplement. It is nonvolatile, difficult to oxidize, non-ionic, and highly soluble in water and has a low molecular weight (60 g/mol). Urea naturally decomposes into ammonia, that even at part per billion concentrations, may negatively impact the performance of the acid-catalyzed, chemically amplified photoresists used in today’s DUV photolithography processes. Due to the increasing demand for high quality UPW in the semiconductor industry with tight specs and need to promote water conservation, it is important to treat urea in UPW and this cannot be achieved with conventional ultrapure water purification techniques.

Benchmarking the Particle Removal Performance of Ultrafiltration Modules in UPW Using Several Particle Metrologies

Najib Alia; Pia Herrling; Philippe Rychen; Ovivo Switzerland

Nanoparticles represent one of the most critical contaminations in ultrapure supplies for semiconductor fabrication. As a final barrier for nanoparticles in the polishing step, ultrafilters are commonly used on UPW plants. However, the performance of the ultrafilters in the field in terms of removal performance for particles needs to be investigated further. Especially for UPW, there is a lack of online particle metrologies down to particle size of sub 50 nm. This study aims to give an overview on different particle metrologies to better understand the particle removal performance by ultrafilters on the market.

Facilities Growth

More factories, bigger in scale than ever before, must be built in record time. How can facilities expand alongside supply chain issues, an expertise shortage, and material scarcity? Find a selection of presentations from this strand below.

Why should you care about Cafeteria Grease Trap cleaning? Chasing Root Cause of Cu Corrosion Defects

Latif Ahmed, Intel

Airborne Molecular Contaminants (AMC’s) have various subclasses including; acids, bases, and metallics which can all be detected using different analytical techniques. Before we reach the point of solving sources of excursion, we must first correlate defects and the contaminants causing said defects. The more obscure and infrequent the defects are, the more difficult it is to find the source. In some cases, by the time defects have manifested, the contamination has dissipated and if metrology for real-time analysis is not in place, it is near impossible to discover the root cause. This presentation uses examples of such an excursion and goes through the process of finding its root cause.

Compressed Air Operational Analysis to Gain Capacity and Improve Efficiency

Matthew Milan, Samsung Austin Semiconductor

Fabs may increase production capacity, which results in an increase in utility usage. As production increases, it may be difficult to complete capacity upgrades for compressed air equipment quickly enough due to equipment and construction lead times. Some systems begin to run out of redundancy. This presentation shows a case study for maintaining redundancy in order to perform proper maintenance and ensure provision of reliable compressed air to end users. The understanding of operational health of equipment is key catch problems before they cause any system impacts.

Advanced Technology Design for hot UPW supply

Ute Sierig, GlobalFoundries

As die scaling decreases, the number of manufacturing process steps increases. As a result, consumption of cold and hot ultrapure waters is significantly higher for state-of-the-art semiconductor fabs. This study shows operational decisions which allowed a fab to increase capacity to consume a greater quantity of hot ultrapure water. This presentation shows a new design in a fab which is successively transferred to the other existing hot ultrapure water plants, in order to be able to react to future changes in consumption.

Environmental Footprint

New sustainability targets, emerging contaminants, and strict regulations pose new problems. How can facilities balance water circularity, chemicals consumption, energy usage, and gas emissions? Find a selection of presentations from this strand below.

PFAS - The Next Great Wastewater Challenge

Bob Leet, Taimur Burki, Intel

An overview of PFAS definitions and the regulatory environment, as well as destruction technologies and capability gaps. Current water treatment methodologies for PFAS focus on Granulated Activated Carbon (GAC) and Ion Exchange Resins (IX). These methods have proven effective at capturing long-chain PFAS such as PFOS/PFOA but have shown to be ineffective at treating short chain PFAS. It has also been found that semiconductor wastewater has large varieties of PFAS species due to chemical reactions and other molecular transformations, further complicating capture techniques. The only known effective capture technology for short chain PFAS at this point is Reverse Osmosis (RO), which is a high-cost technology.

Conserving energy and water through recapture and recirculation of hot UPW

Charles Miller, SCREEN SPE

Common "one-pass" industry practices around generation and application of hot ultra-pure water (hot-UPW) consume large amounts of energy to generate the hot-UPW input. In addition, there is often inefficient use of the resulting water. This presentation showcases engineered solutions to improve efficiency of hot-UPW water use, greatly reducing consumption of hot UPW without any impact to the process.

Eco-efficiency in ultrapure water treatment system design and operation

Andreas Neuber, Applied Materials, Bob McIntosh, Enviro-Energy Solutions

The semiconductor industry has increasingly ambitious sustainability goals. Eco efficiency goals are sometimes difficult to achieve in tandem with each other. For example, high water recovery requires more energy and chemicals. Additional energy also requires more evaporation water in the cooling towers. A modelling tool will be introduced to study scenarios to keep water and energy efficiency in balance and what impact it has on other boundary conditions. Improvements will require a different mindset in the future since potential solutions are multi-disciplinary and require cooperation of many different stake holders in the fab. 

Keynote Speakers

Zac Rosenbaum

Facilities Director, Samsung Austin Semiconductor

Todd Brady

Vice President, Global Public Affairs and Chief Sustainability Officer, Intel

Companies and Institutions in Attendance

IntelSamsung Austin SemiconductorGLOBALFOUNDRIESSuez Water Technologies & SolutionsMicron Technology, Inc.ON SemiconductorNXP SemiconductorOrgano CorporationEvoqua Water TechnologiesGeorg Fischer3M Industrial Business GroupAir Liquide - Balazs NanoanalysisNalco WaterEntegrisFTD SolutionsMGC Pure Chemicals America IncHoriba InstrumentsDuPontFarnsworth GroupIMES Engineering GroupAquafine CorporationExyteFujifilm Electronic MaterialsJacobsKanomax FMTMettler ToledoPall CorporationPeroxyChemTrojan TechnologiesAgilent TechnologiesApplied MaterialsAsahi Kasei CorporationAsahi/AmericaBanner IndustriesHarrington Industrial PlasticsOvivoParticle Measuring SystemsPure PlasticsSACHEMAmresistAqua Metrology SystemsHORIBAJSR MicroKurita Water Industries Ltd.Moses Lake IndustriesPfaudler GroupPureflowSamsung EngineeringSemitorrUncopiersW L Gore & AssociatesAn-Cor Industrial Plastics IncCarollo EngineersDAS Environmental ExpertsDiversified Fluid SolutionsElemental ScientificETH Zurich - UNISERSLanxessMD Henley & AssociatesMGN International IncOvivo Switzerland AGOvivo WaterPlast-O-Matic ValvesTRUMPFVersum MaterialsA.S. Plastics TechnologyAdvanced UVAmetek Fluoropolymer ProductsAS StromungstechnikAxeon Water TechnologiesBarry Wehmiller Design GroupBooky Oren Global Water TechnologiesCabot MIcroelectronicsChemTraceChemtradeDaikin AmericaDivInd LLCDPSHarrington PureHoneywellK-WaterLanxess Sybron Chemicals IncLinear Technology - Analog DevicesMega Fluid SystemsMicron Technology Inc.Purolite CorporationSandia National LaboratoriesSEMISemtechSinha SolutionsState Nuclear Power Plant ServiceSwan Analytical USAThermo Fisher ScientificTosoh USA IncTrebor InternationalWater SpecialtiesAvista TechnologiesCabot ElectronicsChemoursCT Associates IncDiamond FiberglassEnviro-Energy SolutionsFluid Imaging TechnologiesGarlock Sealing TechnologiesGEMU ValvesHeraeus QuarzglasHydranauticsJE DunnJSR MIcroKanomax Holdings IncKMG ChemicalsKorea Water Resources CorporationKTH UniversityKurita America IncLevitronix GmbHLevitronix Technologies LLCMIT Lincoln LaboratoryNeoTech Aqua SolutionsNomura Micro Sciende LtdOptimum EnergyRION CoSemiconductor Smart SolutionsSnowPure Water TechnologiesTSI SemiconductorsAM Technical SolutionsArkemaDiamond CompaniesDOC-LABORGemu ValvesGreene Tweed & CoHeraeus Noblelight AmericaKoch Membrane SystemsLubrizolNomura Micro Science USAORgano CorporationPall GmbHPure Facilities Solutions

Sponsors

We look forward to seeing you in October 2023
Register to attend UPM 2023