Ultrapure Micro 2020 Agenda – Day 1

Monday November 9th

The Ultrapure Micro 2020 virtual agenda is divided over 3 days, from November 9th-11th.

 

The event will be hosted on a custom event platform using GoToMeetings and will utilitize networking software Remo.

DAY 2 >

7:30-7:40 PST

Welcome Address and Best Presentation Awards 2019

7:40-8:20 PST

Keynote Address

IRDS: Devices and Systems Innovation in the Next 15 Years, Paolo Gargini, Chairman, IRDS

8:20-8:25 PST

Introduction to Technical Sessions

Technical sessions are broken up into 15 minute presentations. Each session ends with a Q&A panel with all session speakers.

8:30-9:45 PST

Wafer Contamination Control – Particles Monitoring

8:30-8:45 PST

Microanalysis: A novel method to characterize and speciate contaminants in Ultra Pure Water (UPW) and other aqueous chemicals

Ashutosh Bhabhe, Entegris

8:45-9:00 PST

Particle analysis of unpatterned wafers with UNISERS

Ali Altun, UNISERS

9:00-9:15 PST

Yield Enhancement in Wet Cleaning of Silicon Wafers by Critical Area Analysis

Drew Sinha, Sinha Solutions

9:15-9:45 PST

Q&A Panel

8:30-9:45 PST

UPW Process Optimization

8:30-8:45 PST

Determine functional pore sizes of ultrafiltration membranes by nanoparticle retention test using single particle ICP-MS

Charlie Chan, 3M

8:45-9:00 PST

Leveraging Advanced Analytical Techniques and Productive Data Processing Tools to Address UPW Challenges

Gil Maron, FTD Solutions

Co-authoring organization: Intel

9:00-9:15 PST

Can Nanoparticles penetrate UPW polishing resins? Nanoscale particle interactions by high resolution imaging of single resin beads

Maria Pia Herrling, Ovivo

Co-authoring organization: Karlsruhe Institute of Technology

9:15-9:45 PST

Q&A Panel

8:30-9:45 PST

Water and Resources Conservation

8:30-8:45 PST

Resource Conservation Projects at GLOBALFOUNDRIES Fab8 in Malta, New York

Thomas Huang, GLOBALFOUNDRIES

8:45-9:00 PST

Smart primary wastewater management – Strategies, rules, examples

Jochen Ruth, Pall

9:00-9:15 PST

Construction of a new wastewater recovery system/business model

Tanaka Yu, KURITA WATER INDUSTRIES

9:15-9:45 PST

Q&A Panel

8:30-9:45 PST

Airborne Molecular Contamination (AMC) and High Purity Gases Control

8:30-8:45 PST

A Retrospective Review of AMC Issues: Our Understanding and Issues Incurred,

Walter Den, Texas A&M University-San Antonio

Co-authoring organization: Samsung Austin Semiconductor

8:45-9:00 PST

Comprehensive Online AMC Analysis Using SIFT-MS

Helena Barnes, Syft Technologies

9:00-9:15 PST

The challenges of Improving Sensitivity and Speed of Response for Detecting Airborne Molecular Contaminants in Cleanrooms

Florian Adler, Tiger Optics

New sampling module for ultra-low level cation, anions, and organic acids in air/gases

Maohua Pan, Air Liquide Electronics

9:15-9:45 PST

Q&A Panel

9:55-10:00 PST

Remo Introduction

10:00-10:55 PST

Roundtables

Check the full list here

10:55-11:25 PST

Networking

DAY 2