Tony Ozzello is the Senior Engineering Manager of the Wet Etch and Cleans Application Group at Entegris Corporation in the Microcontamination Control Division. His team oversees testing of new filters to evaluate and predict performance in order to guide development of new technologies and also develops new methods for testing filters. The team also handles evaluation of leading-edge filtration at key semiconductor fabs and chemical customers worldwide.
Tony obtained his Bachelor’s in Chemical Engineering and Master’s in Physics from Michigan State University. He began working at Intel in 1995 as a process development engineer in wafer cleaning and has been working in semiconductor wafer cleaning since then with some additional focus in dry strip and yield. He joined Entegris in 2015.
Tony has published multiple papers in refereed journals in the fields of polymer composites, nuclear physics, and materials science. He has been awarded several patents at Entegris and Intel.