Nanoparticle Profiling in a UPW Polishing Section by Different Monitoring Systems: Advanced Understanding of Sources and Sinks – Maria Pia Herrling, Ovivo Switzerland and Micron Technology
Awarded June 6th at UPM 2019, Phoenix, Arizona.
Proven Success of Innovative Water Management Solutions for Advanced Semiconductor Manufacturing – Alex Milshteen, Intel Corporation
Awarded June 6th at UPM 2019, Phoenix, Arizona.
Ultra High Purity Chemical Challenges – Daniel Stucky, Samsung Austin Semiconductor
Awarded June 6th at UPM 2019, Phoenix, Arizona.