Ultrapure Micro 2018 Agenda
8:00-8:15
The Ultrapure Micro team and Co-Moderators will discuss what to expect from the conference, as well as give the award for the best presentations from the 2017 conference. asdasdasdasd
8:15-8:45
Moore’s law has been slowing down due to electrical, patterning, and yield limits. Fortunately, emerging forces such as new device architecture, optimization and applications are driving the industry. How will cloud computing and connectivity change the growing market and how will it impact water and chemicals management?
8:50-9:30
Slava Libman will present updated standards and procedures from the IRDS working group focused on UPW.
9:30-10:00
COFFEE BREAK
UPW Session 1
Advanced Analytical Methods for UPW
HPC Session 1
High Purity Chemicals in Semiconductor Manufacturing
WM Session 1
Water Management for Advanced Semiconductor Industry
12:00-1:30
Sponsored by
UPW Session 1 Cont.
UPW Session 2
Particle analysis and control in UPW
HPC Session 1 Cont.
HPC Session 2
High Purity Chemicals in Semiconductor Manufacturing
WM Session 1 Cont.
WM Session 2
Efficient Cooling Water Systems’ Operations and Management
2:30-2:50
COFFEE BREAK
UPW Session 2 Cont.
HPC Session 2 Cont.
WM Session 2 Cont.
3:50-4:00
TRANSITION BREAK
4:00-5:45
The UPM 2018 Roundtables Session is a platform to exchange ideas and insights and to engage with one another in a more conversational setting. No microphones, no slideshows. Each Roundtable Speaker will lead three 30-minute discussion groups.
1. How to Develop an Analytical Operating Budget for UPW
– Glen Slayter, Intel Corporation
2. The First Step in Understanding your Site Water Situation
– John Morgan, H2Morgan
3. RO System Operations
– Dan Wilcox, Tesla Motors
4. How to Optimize your Systems Capacity
– Dave Buesser, FTD Solutions
5. How to Optimize your Systems Capacity
– Alex Evashenk, FTD Solutions
6. RO Membrane Cleaning
– Denise Haukkala, Dow Water Solutions
7. Understanding Chemical Purity Specifications
– Don Hadder, Intel Corporation
8. How to Pick the Right Final Filter
– Gerd Heser, Pall GmbH
9. Chemical Distribution and Pumping
– Katie Van Strander and Lukas Weeden, Samsung Austin Semiconductor
10. Understanding Changes in Stainless Steel Components in UPW and WM
– Alan Knapp, Evoqua Water Technologies
11. Wastewater Leak Detection: Types and How They Work
– Hanspeter Mueller, Georg Fischer
12. Selection of Materials for Wastewater Collection Systems
– Adam Herbert, Asahi/America
13. How to Develop an HP/UHP Chemical Operating Budget
– Daniel Stucky, Samsung Austin Semiconductor
14. Managing the Workforce: Mentoring, Cross-Training and Keeping the Knowledge in the Organization
– Varinder Malik, Samsung Austin Semiconductor
15. Do I Need to Change my UPW Treatment System?
– Josh Best, FTD Solutions
16. Do I Need to Change my UPW Treatment System?
– Slava Libman, FTD Solutions
17. Copper Recovery
– Pete Avila III, Semiconductor Smart Solutions
18. Issues and problems with low dissolved oxygen measurement
– Steve deVilleneuve, Swan Analytical Instruments
19. High Solid Waste Streams
– Victoria Yun, Samsung Austin Semiconductor
20. Emerging Contaminants in Wastewater
– Daniel Wilson, Samsung Austin Semiconductor
21. What Affects Particle Counter Performance?
– Ramon Ocanas, MGN International / Rion
21. Filtration for UHP Chemicals – Which Filter is Which and Where do I use it?
– Anthony Ozzello, Entegris
22. New Monitoring Techniques for ClO2 in Microelectronics Wastewater
– Allison Snodgrass, Nalco Water
23. UV Operationing Challenges
– George Diefenthal, NeoTech Aqua Solutions
5:45-6:45
Sponsored by
7:00-10:00
Sponsored by
8:00-8:45
As Moore’s law continues to experience challenges, the pace of innovation continues to drive explosive growth in connected devices. These devices are estimated to triple from 8 to 24 billion by 2020. The demand for data is exploding. As the capital required to compete in the industry gets greater and the technologies more complex, the industry continues to see consolidation. As process nodes push physical boundaries, the need for continuous innovation in the production of ultrapure water and chemicals, as well as the technologies to treat unique and complex waste streams, is a never ending treadmill. Are we prepared?
8:45-9:00
COFFEE BREAK
UPW Session 3
Solving current UPW challenges with Innovative Design Solutions
HPC Session 3
High Purity Chemicals in Semiconductor Manufacturing
WM Session 3
Strategic Site Water Management at the Fab
10:30-11:00
COFFEE BREAK
UPW Session 3 Cont.
HPC Session 3 Cont.
Combined Session
Technology and Project Management in Semiconductor Water and Chemicals
WM Session 3 Cont.
WM Session 4
Brine Management
12:30-1:30
UPW Session 4
Optimization of UPW System Operation
Combined Session Cont.
WM Session 5
Analytical Water Management for Semiconductor Industry
3:30-3:45
TRANSITION BREAK
3:45-4:45
Chair
Slava Libman, FTD Solutions
Panelists
John Painter, GLOBALFOUNDRIES
Dan Wilcox, Tesla
Steven Edmund, Intel Corporation
Daniel Stucky. Samsung Austin Semiconductor
Bob McIntosh,Enviro-Energy Solutions
Microelectronics industry needs are defined, but why are innovations not happening at the desired pace? The IRDS Roadmap and Semi Standards are great examples of industry collaboration aimed at closing these gaps, but is there a better collaboration process between tech users and solution providers? This panel will discuss how to bring innovations to the market and unveil fabs’ perspectives on collaboration and such crucial processes as R&D, infrastructure expansion, supply chain management, risk mitigation and management of water systems and high purity chemicals.