3M: Method for preparing ultra-low PPT level DO in UPW using membrane degassifiers to enable superior wafer surface preparation
3M: A New Approach for Metal Ion Purification to Meet the Needs of Trace Metal Reduction for 10nm Node and Beyond
3M: A Novel Method for Assessing Membrane Removal Efficiency Using Single Particle Inductively Coupled Plasma Mass Spectroscopy
Agilent Technologies: The Analysis and Stability of High Purity TetraMethylAmmonium Hyrdoxide (TMAH) with the Agilent 8900 QQQ-ICPMS
Air Liquide – Balzas NanoAnalysis: A Non-traditional ICP-MS Analysis for Nanoparticles Characterization of Ultra-Pure Water (UPW)
CT Associates, Enviro Energy Solutions, Air Liquide – Balazs NonoAnalysis, and FTD Solutions: Use of Extraction Modeling to Predict Contamination Levels in Ultrapure Water Systems
CT Associates, Aerosol Devices, and Kanomax: The use of Focused Aerosol Deposition (FAD) to capture, identify and quantify killer defect particles in UPW.
Desalitech: Closed Circuit Reverse Osmosis, the New Standard for Industrial Desalination
Elemental Scientific: on-line 24/7 single-ppt metals monitoring for semiconductor process chemicals using a central ICPMS detector connected to 20 remote automated samplers.
Entegris: Empirical model to understand the flush up behavior of particles during bulk chemical filtration
ETH Zurich: DETECTION OF NON-VOLATILE TRACE-IMPURITIES IN ULTRAPURE WATER WITH UNIVERSAL SURFACE ENHANCED RAMAN SPECTROSCOPY
FTD Solutions: Case Study: Leveraging Value Engineering to Achieve Major Cost Savings in UPW System Capacity Upgrade
FTD Solutions: Keeping Increasingly complex Water Management Simple
FTD Solutions: Simple idea – Big Value Cooling Towers
Georg Fischer & CT Associates: Online Measurement of Total Active Ions Activity of Chemicals at Sub-ppb Levels Using Advanced Resistivity Algorithms
Georg Fischer: Thermoplastic pipe stress modeling – Best Known Methods for a safe and reliable long-life piping system
Heraeus: Impact of sleeves quartz quality to the total costs of ownership of UP water reactor (UV@185nm)
H2Morgan & Energy 350: Strategies for electrical energy reduction required for Producing High Purity Water and then qualifying for Capital rebate programs to offset and improve ROI of energy reducing capital projects.
H2Morgan: Creating a Roadmap to Improved System Operation, Capital equipment utilization, and Increased Resource Optimization though developing a dynamic water balance model.
HORIBA and MIE University: Development of Self-Cleaning pH Electrode Coated with Titanium Oxide (TiO2) and Its Photocatalytic Activity
IDE Technologies: WAY TO OPERATE RO SYSTEM WITHOUT FOULING
Intel & Design Group – Facilities Solutions: Retrofitting a traditional UPW Make Up system to Accomplish Recovery Rates of >95% utilizing HERO and the Challenges it Presents
Intel: A Day in the Life of an Analytical Engineer
Intel: Proven Success of Innovative Water Management Solutions for Advanced Semiconductor Manufacturing
Intel: Operational Challenges in Backend UPW Systems
Intel: Strange Case of The High Dollar RO Maintenance Bill: Unsolved Rapid Membrane Degradation And Undissolved Metal Fouling
Intel: Water conservation in semiconductor industry: UPW and beyond
KTH Royal Institute of Technology, XZero AB, imec, and Scarab Development: Performance of Membrane Distillation for TMAH Wastewater Treatment in Nano-electronics Industries – Case Study: IMEC, Belgium
Lanxess: Highly Cross Linked membranes Improve Silica, Boron, Nitrate, and urea Rejection
MGN International: Correlating Particle Counter Data between Different Instruments
Nalco Water: New application and monitoring techniques for chlorine dioxide in a microelectronics wastewater treatment facility
Nalco Water: PCW Best Practices
Nomura Micro Science: Optimization of UPW System with Improved Ion Exchange Resin
NXP Semiconductors & Nalco Water: Benefits of side-stream filtration for condenser water systems in microelectronics
ON Semiconductor & H2Morgan: Water Treatment System Hacks – Maintain, expand, and optimize your water and wastewater treatment systems without breaking the bank.
Organo: Online urea monitori for ultrapure water production in semiconductor fabrication plants
Organo: Purification method for high purity PGMEA using ion exchange resins and analysis of high sensitive trace metals by ICP-MS
Organo: Purification method for high purity PGMEA using ion exchange resins and analysis of high sensitive trace metals by ICP-MS
Organo: Purification of Chemicals for Semiconductor Use by Ultra-clean Ion Exchange Resins
Organo, GLOBALFOUNDRIES, and Enviro Energy Solutions: Evaluation of the Particle Behaviour in Ultrapure Water System Distributions Using 10 nm or Larger Particles Measuring Method
Ovivo & Applied University Furtwangen: UPUR – A Metal-free Combination of Several UPW Polishing Steps in a multifunctional reactor for the Removal of TOC and H2O2 Traces.
Ovivo & Micron Technology: Nanoparticle profiling in a UPW polishing section by different monitoring systems: advanced understanding of sources and sinks
Ovivo: MEC or Membrane Enhanced Crystallizer; a new process for semiconductor HF wastewater treatment
Pall and RBFM Consulting: Filter media removal characteristics in the low nm range
Particle Measuring Systems: Understanding Nanoparticle contamination in chemical distribution systems – data analysis strategies
PeroxyChem: Novel Approach for the Treatment of Wastewater Generated During Semiconductor Wafer Fabrication
Saltworks Technology: Brine Management Options: Technology, Innovation, & Economics for Zero Liquid Discharge
Samsung Austin Semiconductor & Evoqua Water Technologies: Copper Ion Exchange at SAS: Concept to Large-Scale Design
Samsung Austin Semiconductor: Ultra High Purity Chemical Challenges
Semiconductor Smart Solutions: Advanced Chemisorption media to remove Silica, fluoride, arsenic, copper, and other contaminants in Industrial waters and cooling towers.
Suez Water and Technology Solutions: Evaluatuon of Trace Total organic Carbon in High Purity Sulfuric acid
Sumco: Evaluating the Risk of Metal Contamination from Wet Cleaning of Silicon Wafers by HF-last Process
SWAN Analytical: Low level Oxygen Detection in Seminconductor Manufacturing – What Really Matters
Texas Instruments & Ovivo: Semiconductor End of Pipe Wastewater Reclaim System – Piloting Data.
Trojan Technologies: Performance and sizing of UV reactors for TOC destruction in ultrapure water.
We’d like to thank everyone for submitting an abstract for UPMicro 2018. Submission Deadline was Friday, March 2, 2018 at 11.59 PM PST. UPMicro 2018 focuses on microelectronics industry water and chemicals management and will have three main focus areas:
All accepted presentations must be prepared in accordance with the UPMicro Presentations Guidelines. Authors of the accepted presentations are highly encouraged to develop a publication in a form of a technical paper for publication on Ultrapuremicro.com.
If you have any questions, please get in touch with Yana Nazarova at yana.nazarova@globalwaterintel.com or +1 (512) 879-4208.