Substrate Environment Contamination Control: The Manufacturing Tools Perspective

Substrate Environment Contamination Control: The Manufacturing Tools Perspective offers you the opportunity to hear from a segment of the industry entirely new to UPM as we bring the discussion closer to the wafer environment. Our goal is to connect the technologies’ supply chain to enhance the understanding of the industry’s needs and to enable contamination control.

The webinar will start with a presentation by Nabil Mistkawi, Samsung Austin Semiconductor, who from an OEM perspective will identify key technology requirements for wet chemicals and gases. It will be followed by a panel discussion with the leading experts from tool OEM companies, who will address specific environments and process steps to ensure yield.

Opening Remarks: Slava Libman, FTD Solutions

Moderator: Dan Wilcox, Page/imes

Speakers: Abbas Rastegar, Applied Materials; Marcel Teunissen, ASML; Jim Snow, SCREEN SPE;  Rushi Matkar, Intel; Nabil Mistkawi, Samsung Austin Semiconductor.

WEBINAR AGENDA

Technology Trends and Requirements for Wet Chemicals and Gases: Nabil Mistkawi identifies key technology requirements for wet chemicals and gases in his presentation.

Panel Discussion: Following the presentation we will continue with a panel discussion exploring contamination control needs of individual environments and showing where contamination impacts the processbringing together the supply chain with the cleanroom.

Live Q&A Session: We will close the webinar with a live Q&A session where you will have the chance to present your questions.

Can’t attend? Register anyway and we’ll send you the recording and slides after the event.

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