Agenda

Tuesday 10th October
Day 0
17:30-18:30
Welcome Reception

Join old friends and new partners ahead of the main conference at the UPM 2023 Day 0 Welcome Reception. Who is coming this year? You can find an up to date delegate list here

Wednesday 11th October
Day 1
07:00-08:00
Registration & Refreshment
08:00-08:20
Welcome Remarks & 2022 Best Presentation Awards

A warm welcome from both the organizers and the 2023 Facility Host, Samsung Austin Semiconductor.

We will also present the 2022 Best Presentation Awards, as voted by delegates last year. 

  • Jablanka Uzelac, Managing Director, Global Water Intelligence
  • Zac Rosenbaum, Facilities Director, Samsung Austin Semiconductor
  • Orla McCoy, UPM Community Manager, Global Water Intelligence
08:20-09:30
Opening Plenary: Unlocking Facility 2.0

Semiconductor facilities are facing a paradox. The next generation of sophisticated technology will bring solutions to many of the most critical global problems – such as sustainability, workforce challenges, and digitalization needs. However, semiconductor facilities are struggling to navigate these same problems. Technology progress means mega-fabs are becoming more resource-intensive, bigger, harder to staff, and more complex to build.

New approaches towards operating the next generation of semiconductor facilities must be embraced to unlock the future of technology. As such, the conference theme – ‘Unlocking Facility 2.0.’ – describes the progress towards addressing the revolutionary changes to facility construction, sustainable operations, and high purity critical systems.

  • Slava LibmanCEO, FTD Solutions (Moderator)
  • Paul Callaghan, VP of Global Facilities Services, Wolfspeed
  • Jeff Smith, VP, Facilities Infrastructure, Samsung Austin Semiconductor
  • Jeff Walker, Executive Administrator, Texas Water Development Board
  • Jeff Brightman, Principal Vice President, Bechtel Manufacturing & Technology 
09:30-10:00
Coffee Break
Sponsored by:
10:00-12:00
Facilities’ Growth & Efficiency
DETAILS
10:00: Facilities' Growth & Efficiency - Introductory Panel
10:00: Facilities' Growth & Efficiency - Introductory Panel

Construction in the semiconductor industry is undergoing a ‘perfect storm’ of issues. Total manufacturing construction spending has doubled in the US since the end of 2021, but productivity is hitting a record low. This panel will reveal why new approaches to construction are relevant to the entire value chain. 

This panel will answer three key questions: 

  1. What is the right approach to offsite manufacturing, and how is critical for supporting the industry’s construction needs? 
  2. Why does the semiconductor industry so urgently need a digital transformation? 
  3. How can the supply chain react and collaborate to help ramp up semiconductor facilities faster and at a high quality? 

Moderated by:

Speakers:

  • Barak Gur-Arie, VP Operations, Buildots
  • Jeff Brightman, Principal Vice President, Bechtel Manufacturing & Technology
  • Scott Corney, Technical Domain Leader - Microelectronics, Veolia Water Technologies & Solutions
DETAILS
11:00: Spotlight Presentation: OSM, a Revolutionary Step for the Industry
Intel
11:00: Spotlight Presentation: OSM, a Revolutionary Step for the Industry

 

Presented by:

Yinguo Cheng, Process Engineer Group Leader, Intel

Environmental Sustainability
DETAILS
10:00: Environmental Sustainability - Introductory Panel
10:00: Environmental Sustainability - Introductory Panel

Sustainability is an industry priority. However, with the incorporation of sophisticated new semiconductor technology such as Gate-All-Around (GAA) transistors, the industry’s water, energy, chemical and gas footprint is set to increase rapidly. This panel will bring in multiple thought-leaders from across the industry to explain what is driving the sustainability effort and where the key capability gaps lie.  

This panel will answer three key questions: 

  1. How will GAA and other semiconductor developments affect those working in the sustainability field? 
  2. Where are facilities focusing their efforts in offsetting their footprints?
  3. How do facilities manage trade-offs and difficult decisions relating to sustainability? 

Moderated by:

  • Alan Knapp, Senior Director, Microelectronics Market, Evoqua Water Technologies

Speakers:

  • Nabil Mistkawi, Principal Engineer/Technologist, Samsung Austin Semiconductor
  • Walt Kozlowski, Sr. Director Client Sustainability Solutions, Evoqua Water Technologies
  • Jim Snow, Senior Technologist, SCREEN SPE
DETAILS
11:00: Not-So-Forever Chemicals: Field Demonstration of PFAS Destruction by a Pilot-Scale Nanofiltration and...
Kennedy Jenks Consultants
11:00: Not-So-Forever Chemicals: Field Demonstration of PFAS Destruction by a Pilot-Scale Nanofiltration and UV-Sulfite Treatment Train

Presented by:
Charlie Liu, National PFAS Lead, Kennedy Jenks Consultants

DETAILS
11:30: PFAS Analysis in UPW and Process Water
Air Liquide
11:30: PFAS Analysis in UPW and Process Water

Presented by:
Allen Chan, R&D Scientist, Air Liquide

Co-Author(s):
Hugh Gotts, Senior Director of Research Development, Air Liquide

High Purity Environments
DETAILS
10:00: High Purity Environments - Introductory Panel
14si Solutions, Samsung Austin Semiconductor, Balazs NanoAnalysis
10:00: High Purity Environments - Introductory Panel

With new technologies demanding complex chip designs, yield is a key focus for endusers. Process steps are increasing exponentially, monitoring is becoming more challenging, and critical defect sizes are shrinking. Ultrapure water and chemicals are the last lines of defence before each process steps – contamination control has never been more important. 

This panel will answer three key questions: 

  1. What is a wafer defect, and what causes it?  
  2. How can we detect the source of contamination and deal with the root cause?  
  3. How can we control contamination when metrology cannot keep up with the demands of new semiconductor technology?   

Moderated by:

Speakers:

  • Jason Maas, Senior Director of Electrical, Gas and Chemical Facilities, Samsung Austin Semiconductor
  • Hugh Gotts, Senior Director of Research and Development, Balazs NanoAnalysis
  • Anthony Ozzello, Senior Engineering Manager, Wet Etch and Cleans Applications, Liquid Microcontamination, Entegris

 

DETAILS
11:00: Advancing process control based on enhanced particle counter matching at the 20nm level
Particle Measuring Systems
11:00: Advancing process control based on enhanced particle counter matching at the 20nm level

Presented by:
Dan Rodier, Staff Scientist, Particle Measuring Systems

DETAILS
11:30: A novel nanoparticle counter for UPW based on acoustic cavitation
Ovivo
11:30: A novel nanoparticle counter for UPW based on acoustic cavitation

Presented by:
Najib Alia, Innovation Engineer, Ovivo

Co-Author(s):
Ian Briggs, Ovivo
Pranit Iyengar, Innovation Engineer, Ovivo
Pia Herrling, Head of Nanoparticle Group and Project Manager Innovation, Ovivo
Philippe Rychen, Global Director of Innovation, Ovivo

12:00-13:00
Lunch
Sponsored by:
13:00-15:00
Facilities’ Growth & Efficiency
DETAILS
13:00: Leveraging data driven workflows to shorten the design change lifecycle
Farnsworth Group
13:00: Leveraging data driven workflows to shorten the design change lifecycle

Presented by:
Brandon Ekberg, Principal, Farnsworth Group
Darin Amsberry, Director of Process Piping, Farnsworth Group

DETAILS
13:30: Intelligent P&IDs: Building & Operating More Efficiently
GF Piping Systems & Hexagon Engineering & Design Solutions
13:30: Intelligent P&IDs: Building & Operating More Efficiently

Presented by:

John Painter, Principal, Pure Facilities Solutions LLC
Daniel Williams, Senior Industry Consultant, Hexagon Engineering & Design Solutions

DETAILS
14:00: Energy and water use efficiency considerations in Ultrapure and wastewater system design and operation...
Applied Materials
14:00: Energy and water use efficiency considerations in Ultrapure and wastewater system design and operation for semiconductor fabs

Presented by:
Andreas Neuber, SR Director for Eco Efficiency and Sustainability, Applied Materials

DETAILS
14:30: Accelerating Water Technology Innovation in the Semiconductor Industry
FTD Solutions
14:30: Accelerating Water Technology Innovation in the Semiconductor Industry

Presented by:
Emile McCormick, Project and Partnerships Manager, FTD Solutions

Co-Author(s):
Bonnie Marion, Technology Director - Water Systems, FTD Solutions

Noga Fridman-Bishop, R&D Lead, Sr. Project Engineer, FTD Solutions

Josh Best, VP of Innovation, FTD Solutions

Slava Libman, CEO, FTD Solutions

Environmental Sustainability
DETAILS
13:00: Reclaim of Ozonated Water
Screen SPE
13:00: Reclaim of Ozonated Water

Presented by:
Rey Tanaka, Product Engineer, Screen SPE

Co-Author(s):
Paul Kerr, Strategic Facilities Engineer, Intel
Jim Snow, Senior Technologist, Screen SPE

DETAILS
13:30: Overcoming challenges in reclaiming wet bench rinse waters back into a UPW system
Evoqua Water Technologies
13:30: Overcoming challenges in reclaiming wet bench rinse waters back into a UPW system

Presented by:
Glen Sundstrom, UPW Techncial Director, Evoqua Water Technologies

Co-Author(s):
Stephen Witt, Facilities Engineer, Silfex, Inc.

DETAILS
14:00: Water reclamation into UPW systems
Isle Group Ltd. & STMicroelectronics
14:00: Water reclamation into UPW systems

Presented by:
Carles Crespo, Director of Corporate Industrial Water Practice, Isle Group Ltd.
Mattias Espanet, Facilities Process Program Manager, STMicroelectronics

DETAILS
14:30: Developing Water Reclaim Solutions for Existing Fabs
Gradiant
14:30: Developing Water Reclaim Solutions for Existing Fabs

Presented by:

Hiep Le, Chief Technology Officer, East Hemisphere, Gradiant

Co-Author(s):
Kurt Blohn, Process Engineer, Gradiant

John Tracy, VP of Sales and Business Development, Gradiant

High Purity Environments
DETAILS
13:00: Identification and Management of Potential Particle Precursors from Mixed Bed Ion Exchange
CT Associates, Inc
13:00: Identification and Management of Potential Particle Precursors from Mixed Bed Ion Exchange

Presented by:
Larry Zazzera, Corporate Scientist, CT Associates, Inc

Co-Author(s):
Stefan Huber, DOC-LABOR
Gary Van Schooneveld, President, CT Associates
Bonnie Marion, Technology Director, FTD Solutions

 

DETAILS
13:30: Application of a New SEMI F121 Guide for Evaluating Particle Precursor Metrology
CT Associates Inc.
13:30: Application of a New SEMI F121 Guide for Evaluating Particle Precursor Metrology

Presented by:
Mark Litchy, Staff Engineer, CT Associates Inc.

Co-Author(s):
Derek Oberreit, Vice President, Kanomax FMT
Bonnie Marion, Technology Director, FTD Solutions
Gary Van Schooneveld, President, CT Associates Inc.
Larry Zazzera, Corporate Scientist, CT Associates Inc.

DETAILS
14:00: A study on the defectivity of particle precursors using surface enhanced Particle sizing (SEPS)
UNISERS
14:00: A study on the defectivity of particle precursors using surface enhanced Particle sizing (SEPS)

Presented by:
Ali Altun, CEO and Co-Founder, UNISERS

DETAILS
14:30: Interaction of Nanoparticles with Ion Exchange Resin Beds in UPW polish systems
Ovivo
14:30: Interaction of Nanoparticles with Ion Exchange Resin Beds in UPW polish systems

Presented by:
Lisa Klammsteiner, Innovation Engineer Nanotechnologies, Ovivo

Co-Author(s):
Pranit Iyengar, Innovation Engineer, Ovivo

Philippe Rychen, Global Director of Innovation, Ovivo

Pia Herrling, Head of Nanoparticle Group and Project Manager Innovation, Ovivo

Prof. Dr. Gisela Guthausen, Karlsruhe Institute of Technology, Germany

 

15:00-15:30
Coffee Break
15:30-17:30
Facilities’ Growth & Efficiency
DETAILS
15:30: A paradigm shift for wastewater recycling operations using AI
Gradiant
15:30: A paradigm shift for wastewater recycling operations using AI

Presented by:

Mike DixonCEO - SmartOps, Gradiant

 

Co-Author(s):
Hiep Le, Chief Technology Officer, East Hemisphere, Gradiant International Holdings Pte Ltd

Jia Shin Ho, New Product Initiative (NPI) Scientist, Gradiant International Holdings Pte Ltd

DETAILS
16:00: Unlocking Opportunities for Reaching Sustainability Goals for Existing and New Fab’s
FTD Solutions
16:00: Unlocking Opportunities for Reaching Sustainability Goals for Existing and New Fab’s

Presented by:
Gil Maron, Sr. Application Engineer, FTD Solutions

Co-Authors

Hwee Kiang Lee, Senior Member of Technical Staff & Water Pillar Lead for Sustainability, Micron

Deena Starkel, Principal Water Engineer, Micron

 

DETAILS
16:30: Time to Market for Commissioning
LotusWorks
16:30: Time to Market for Commissioning

 

Presented by:

Darragh Sweeney, Global Commissioning Program Manager, LotusWorks

DETAILS
17:00: Modular OSM Constructs for Improved Cost, Schedule, EHS and Environmental Benefit
Veolia Water Technologies & Solutions
17:00: Modular OSM Constructs for Improved Cost, Schedule, EHS and Environmental Benefit

Presented by:
Scott Corney, Technical Domain Leader - Microelectronics, Veolia Water Technologies & Solutions

Environmental Sustainability
DETAILS
15:30: Systematic Process Technology Selection for treating SiC containing Waste Water
Pall GmbH
15:30: Systematic Process Technology Selection for treating SiC containing Waste Water

Presented by:
Jochen Ruth, SLS Director, Pall GmbH

Co-Author(s):
Gerd Heser, Director of Product Planning and Management Water, Pall GmbH

DETAILS
16:00: Building a more Sustainable Cu-CMP Process: Selective Copper Removal and Recovery
ElectraMet
16:00: Building a more Sustainable Cu-CMP Process: Selective Copper Removal and Recovery

Presented by:
Cameron Lippert, Chief Innovation Officer, ElectraMet

Co-Author(s):
James Landon, CTO, ElectraMet
Alan Rassoolkhani, Process Engineering Manager,  ElectraMet

DETAILS
16:30: Azoles removal from CMP wastewater – Oxidation vs. Novel Complexation Method
Veolia Water Technologies & Solutions
16:30: Azoles removal from CMP wastewater – Oxidation vs. Novel Complexation Method

Presented by:
Rudy Labban, Bid Manager, Veolia Water Technologies & Solutions

DETAILS
17:00: Balancing ESG Goals and Zero Liquid Discharge
Aquatech
17:00: Balancing ESG Goals and Zero Liquid Discharge

Presented by:
Michael Lesniak, VP Net Zero Partnerships, Aquatech International

Co-Author(s):
Ben Means, Manager, Project Development, Aquatech International

Taylor Cowan, Marketing Communication Manager, Aquatech International

Josh Best, VP of Innovation, FTD Solutions

Ravi Chidambaran, President & Chief Technology Officer, Aquatech International

Boris Eliosov, Chief Technology Officer, FTD Solutions

High Purity Environments
DETAILS
15:30: Use of Fluorescent Molecules as Surrogate Nano-contaminants to Monitor the Integrity of Reverse Osmosis...
Nalco Water
15:30: Use of Fluorescent Molecules as Surrogate Nano-contaminants to Monitor the Integrity of Reverse Osmosis Membranes in Ultrapure Water Systems

Presented by:
Seong Hoon Yoon, Corporate Scientist, Nalco Water

DETAILS
16:00: A surprising result when PVDF pipe installed for 9 years was tested for extractables
Georg Fischer Piping Systems
16:00: A surprising result when PVDF pipe installed for 9 years was tested for extractables

Presented by:
Robert McIntosh, Technical Market Manager, GF Piping Systems

Co-Author(s):
Casey Williamson, ME Market Development Manager, GF Piping Systems

DETAILS
16:30: Impact of H2O2 Concentration in UPW on (Ultra) Filters Performance
Pall GmbH
16:30: Impact of H2O2 Concentration in UPW on (Ultra) Filters Performance

Presented by:
Jochen Ruth, SLS Director Microelectronics Europe, Pall GmbH

Co-Author(s):
Gerd Heser, Application Manager UPW & Systems, Pall GmbH
Philippe Rychen, Global Director of Innovation, Ovivo

DETAILS
17:00: Predicting Hydrogen Peroxide concentration for effective control in Ultrapure Water Polishing Loop
Trojan Technologies
17:00: Predicting Hydrogen Peroxide concentration for effective control in Ultrapure Water Polishing Loop

Presented by:
Ferdinando Crapulli, Research Scientist, Trojan Technologies

Co-Author(s):
Michael Sasges, Senior Research Engineer, Trojan Technologies

17:30-21:00
Drinks & Dinner
Sponsored by:

For our drinks and dinner reception we shall be visiting the Texas Rock House. Transport to and from the venue will be provided. Do join us as we celebrate the industry being together once again!