This welcome drinks' reception will be open to anyone arriving to register for the conference.
Jablanka Uzelac, Global Water Intelligence
Zac Rosenbaum, Samsung Austin Semiconductor
Slava Libman, FTD Solutions
Opening Keynote Panel: Facilities Growth
Moderator: Alex Milshteen, Intel Corporation
Speakers: Elizabeth Betancourt, Intel Corporation, John Painter, Georg Fischer, Greg Jackson, Taiwan Semiconductor Manufacturing Company (TSMC), Darragh Sweeney, LotusWorks
Latif Ahmed, Intel **Pre-recorded Presentation
Gas Analytical Needs and Expectations for EUV nodes
Kristine Andrysco, Samsung Austin Semiconductor
Opening Keynote Panel: Yield and Reliability
Moderator: Slava Libman, FTD Solutions
Speakers: Nabil Mistkawi, Samsung Austin Semiconductor, Abbas Rastegar, Applied Materials, Jim Snow SCREEN SPE
Online Automated Determination of Organic Contaminants in Semiconductor Grade Chemicals
Alex Lang, Elemental Scientific
Interconnect Metal Recess Using Functional Water Solutions for Next-Generation Semiconductor Device Manufacturing
Nobuko Gan, Kurita Water Industries
Opening Keynote Panel, Environmental Footprint
Moderator: Paul Kerr, Intel Corporation
Kelly Osborne, Intel Corporation, Josh Best, FTD solutions, Dane Louvier, Samsung Austin Semiconductor
Eco Efficiency in Ultrapure Water Treatment System Design and Operation and Site Water/Energy Relationship
Bob McIntosh, Enviro Energy Solutions
Conserving Energy and Water Through Recapture and Recirculation of Hot UPW
Charles Miller, SCREEN SPE
On-wafer Defectivity Analysis of UPW With Successive Spin Drying
Ali Ozhan Altun, UNISERS
Establishing Correlations between UPW Quality and Particle Deposition on Silicon 300 mm Wafer
Philippe Rychen, Ovivo Switzerland
Critical Organics Risk Assessment of High-Purity Polymer Piping
Gary Van Schooenveld, CT Associates
Measurement of Particle Concentration and Wafer Defects during Ion Exchange Resin Rinse
Derek Oberreit, Kanomax FMT
Membrane Distillation: a Solution to PFAS Removal and Energy Optimization in the Semiconductor Industry
Andreas Tornblom, Xzero AB
PFAS – The Next Great Wastewater Challenge
Taimur Burki, Intel
Sustainable Water Treatment and Recycling using Novel Hollow Fiber Nano-filtration
Jörg Winter, NX Filtration
PFAS Treatment Management & Design Best Practices
Scott Corney, SUEZ **Please note this presentation is pending final approval
Compressed Air Operational Analysis to Gain Capacity and Improve Efficiency
Matthew Milan, Samsung Austin Semiconductor
Streamlining Data Driven Decisions to Support Facility 2.0 Needs
Gil Maron, FTD Solutions and Kelly Osborne, Intel Corporation
Construction Digitalization
Assaf Harel, Intel Corporation
The Case for Prefabrication of Preloaded Piping Racks With Full Design Services
John Painter, Georg Fischer
Study on How Ultrapure Water Could Contribute to Particle Types Identified on Wafer, and How Ion Exchange Resin Selection Could Make a Difference
Yoichi Tanaka, Kurita Water Industries, and Jas Wai Yeng Cheong, Intel ** Pre-recorded Presentation
Benchmarking the Particle Removal Performance of Ultrafiltration Modules in UPW Using Several Particle Metrologies
Najib Alia, Ovivo Switzerland
Facility 2.0: The Challenge TOC < 0.1 ppb and what LC-OCD has to say
Stefan Huber, DOC-LABOR
Recycle of SPM in Single-Wafer Process Applications
Charles Miller, SCREEN SPE
Maximizing Water Recycling and Minimizing Wastewater Volumes
Amrat Gandhi, Gradiant
Membrane Protection Through Efficient Dechlorination Control with Direct, Accurate and Automatic Measurement of Low-PPB Chlorine Residual
Denton Slovacek, Hach
1 Hour Panel Discussion on Facility Construction
Moderator: Bob Mcintosh, Enviro-Energy Solutions
Speakers: Dave Buesser, FTD Solutions, Chee Tan, Intel, Cordell Tietz, Charter, Alan Knapp, Evoqua.
RE-USING UPW PVDF PIPE – Can we re-use PVDF pipe for UPW?
Katrin Wallheinke and Christian Schiefer, Georg Fischer Piping Systems