Ultrapure Micro 2020 - Day 2

Tuesday November 10th

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7:30-7:35 PST

Welcome Remarks

7:35-8:20 PST

Keynote Presentation

Semiconductor Market Trends – Optimistic Uncertainty of 2020 and Beyond, Dave Anderson, President, SEMI Americas

8:20-8:25 PST

Introduction to Technical Sessions

Technical sessions are broken up into 15 minute presentations. Each session ends with a Q&A panel with all session speakers.

8:25-8:30 PST

Transition Break

8:30-9:45 PST

Critical Particle Monitoring

8:30-8:45 PST

Measurement of Particle Precursors in Ultrapure Water

Gary van Schooneveld, CT Associates

8:45-9:00 PST

Fundamentals of Acoustic Particle Counting and Validation for UPW Monitoring

Najib Alia, Ovivo

9:00-9:15 PST

Development and Evaluation of a 3 nm Ultrapure Liquid Quality Monitor,

Derek Oberreit , Kanomax FMT

9:15-9:45 PST

Q&A Panel

8:30-9:45 PST

UPW System Improvement

8:30-8:45 PST

Risks incurred chemical state change of silica in ion exchange resins and their countermeasures

Atsushi Muramatsu, KURITA WATER INDUSTRIES

8:45-9:00 PST

Endotoxin Reduction in UPW

Majid Entezarian and Kristy Bellview, 3M

9:00-9:15 PST

Approaching UPW System Management and Design in a Systematic Way

Joshua Best, FTD Solutions

9:15-9:45 PST

Q&A Panel

8:30-9:45 PST

Wastewater Treatment

8:30-8:45 PST

Durability improvement of fluoride ion sensor against hydrogen peroxide in wastewater management

Takamasa Kinoshita, HORIBA

Co-authoring organization: Samsung Austin Semiconductor

8:45-9:00 PST

Biological Point of Use Wastewater Treatment

Joerg Winter, DAS Environmental Expert

 

9:00-9:15 PST

Hydrofluoric Acid Neutralization and Precipitation Utilizing High Performance Lime

Narahari Kramadhati, Lhoist

Co-Authors: Luke Wilson and Stephanie Lopez, Samsung Austin Semiconductor

9:15-9:45 PST

Q&A Panel

8:30-9:45 PST

Contamination Control in Liquid Chemicals

8:30-8:45 PST

Effects of Static Electricity on Voltage-sensitive Metrology for Chemical Delivery Systems

Michael Perkins, Mega Fluid Systems

8:45-9:00 PST

When Should Skew Corrected Control Limits be Updated?

Thomas Bzik, Versum Materials

9:00-9:15 PST

Method Development for Trace Impurities in Novel Sub-nm Photoresists by Inductively Coupled Plasma Mass Spectrometry (ICP-MS)

Mohsina Islam, ChemTrace, A Business Unit of UCT

9:15-9:45 PST

Q&A Panel

9:45-9:50 PST

Transition Break

9:55-10:00 PST

Remo Introduction

10:00-10:55 PST

10:55-11:25 PST

Networking